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China wholesale 3-Amino-5-Methyl-4h-1 2 4-Triazole - 3-Amino-5-mercapto-1, 2, 4-triazole – Hailun New Material

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In an effort to finest meet up with client's requirements, all of our operations are strictly performed in line with our motto "High High quality, Competitive Rate, Fast Service" for 4 Amino 124 Triazole, 4 Amino 124 Triazole, Aminoguanidine Molecular Mass, The main goal of our company is to live a satisfactory memory to all the customers, and establish a long term business relationship with buyers and users all over the world.
China wholesale 3-Amino-5-Methyl-4h-1 2 4-Triazole - 3-Amino-5-mercapto-1, 2, 4-triazole – Hailun New Material Detail:

Product Name: 3-Amino-5-mercapto-1,2,4-triazole
 3-Amino-1,2,4-triazole-5-thiol; 5-amino-4h-1,2,4-triazole-3-thiol; ATSA
CAS: 16691-43-3
Molecular Formula:C2H4N4S
Molecular Weight: 116.14
Appearance and properties: gray white powder
Density: 2.09 g / cm3
Melting point: > 300 ° C (lit.)
Flash point: 75.5 ° C
Rate: 1.996
Steam pressure: 0.312mmhg at 25 ° C
Structural Formula:

hhh4

Use: As pharmaceutical and pesticide intermediate,It can be used as additive of ballpoint

pen ink, lubricant and antioxidant

Index name

Index Value

Appearance

white or grey powder

Assay

≥ 98 %

M.P.

300 ℃

Drying loss

≤ 1 %

If 3-amino-5-mercapto-1,2 is inhaled, 4-triazole, please move the patient to fresh air; in case of skin contact, take off the contaminated clothes and wash the skin thoroughly with soapy water and water. If you feel uncomfortable, seek medical advice; if you have eye clear contact, separate the eyelids, rinse with flowing water or normal saline, and seek medical advice immediately; if ingested, gargle immediately, do not induce vomiting, and seek medical advice immediately.

It is used to prepare a photoresist cleaning solution

In the common LED and semiconductor manufacturing process, the mask of photoresist is formed on the surface of some materials, and the pattern is transferred after exposure. After obtaining the required pattern, the residual photoresist needs to be stripped before the next process. In this process, it is required to completely remove the unnecessary photoresist without corroding any substrate. At present, photoresist cleaning solution is mainly composed of polar organic solvent, strong alkali and / or water, etc. the photoresist on the semiconductor wafer can be removed by immersing the semiconductor chip into the cleaning liquid or washing the semiconductor chip with the cleaning liquid.

A new type of photoresist cleaning solution has been developed, which is a non-aqueous low etching detergent. It contains: alcohol amine, 3-amino-5-mercapto-1,2,4-triazole and cosolvent. This kind of photoresist cleaning solution can be used to remove photoresist in LED and semiconductor. At the same time, it has no attack on the substrate, such as metal aluminum. What’s more, the system has strong water resistance and widens its operation window. It has a good application prospect in the fields of LED and semiconductor chip cleaning.


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China wholesale 3-Amino-5-Methyl-4h-1 2 4-Triazole - 3-Amino-5-mercapto-1, 2, 4-triazole –  Hailun New Material detail pictures


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It truly is our responsibility to fulfill your requirements and successfully provide you. Your fulfillment is our best reward. We're seeking forward in your check out for joint development for China wholesale 3-Amino-5-Methyl-4h-1 2 4-Triazole - 3-Amino-5-mercapto-1, 2, 4-triazole – Hailun New Material , The product will supply to all over the world, such as: Bahrain, Turkey, The Swiss, With its rich manufacturing experience, high-quality products, and perfect after-sale service, the company has gained good reputation and has become one of the famous enterprise specialized in manufacturing series.We sincerely hope to establish business relation with you and pursue mutual benefit.
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    We are really happy to find such a manufacturer that ensuring product quality at the same time the price is very cheap.
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