Good Quality 3-Amino-5-Mercapto-1,2,4-Triazole - 3-Amino-5-mercapto-1, 2, 4-triazole – Hailun New Material
Good Quality 3-Amino-5-Mercapto-1,2,4-Triazole - 3-Amino-5-mercapto-1, 2, 4-triazole – Hailun New Material Detail:
Product Name: 3-Amino-5-mercapto-1,2,4-triazole
3-Amino-1,2,4-triazole-5-thiol; 5-amino-4h-1,2,4-triazole-3-thiol; ATSA
CAS: 16691-43-3
Molecular Formula:C2H4N4S
Molecular Weight: 116.14
Appearance and properties: gray white powder
Density: 2.09 g / cm3
Melting point: > 300 ° C (lit.)
Flash point: 75.5 ° C
Rate: 1.996
Steam pressure: 0.312mmhg at 25 ° C
Structural Formula:
Use: As pharmaceutical and pesticide intermediate,It can be used as additive of ballpoint
pen ink, lubricant and antioxidant
Index name |
Index Value |
Appearance |
white or grey powder |
Assay |
≥ 98 % |
M.P. |
300 ℃ |
Drying loss |
≤ 1 % |
If 3-amino-5-mercapto-1,2 is inhaled, 4-triazole, please move the patient to fresh air; in case of skin contact, take off the contaminated clothes and wash the skin thoroughly with soapy water and water. If you feel uncomfortable, seek medical advice; if you have eye clear contact, separate the eyelids, rinse with flowing water or normal saline, and seek medical advice immediately; if ingested, gargle immediately, do not induce vomiting, and seek medical advice immediately.
It is used to prepare a photoresist cleaning solution
In the common LED and semiconductor manufacturing process, the mask of photoresist is formed on the surface of some materials, and the pattern is transferred after exposure. After obtaining the required pattern, the residual photoresist needs to be stripped before the next process. In this process, it is required to completely remove the unnecessary photoresist without corroding any substrate. At present, photoresist cleaning solution is mainly composed of polar organic solvent, strong alkali and / or water, etc. the photoresist on the semiconductor wafer can be removed by immersing the semiconductor chip into the cleaning liquid or washing the semiconductor chip with the cleaning liquid.
A new type of photoresist cleaning solution has been developed, which is a non-aqueous low etching detergent. It contains: alcohol amine, 3-amino-5-mercapto-1,2,4-triazole and cosolvent. This kind of photoresist cleaning solution can be used to remove photoresist in LED and semiconductor. At the same time, it has no attack on the substrate, such as metal aluminum. What’s more, the system has strong water resistance and widens its operation window. It has a good application prospect in the fields of LED and semiconductor chip cleaning.
Product detail pictures:
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Dependable good quality and very good credit score standing are our principles, which will help us at a top-ranking position. Adhering towards the tenet of "quality initial, shopper supreme" for Good Quality 3-Amino-5-Mercapto-1,2,4-Triazole - 3-Amino-5-mercapto-1, 2, 4-triazole – Hailun New Material , The product will supply to all over the world, such as: Russia, Macedonia, Serbia, Insisting on the high quality generation line management and customers expert assistance, we now have designed our resolution to supply our buyers using the to start with amount getting and just after services practical experience. Maintaining the prevailing friendly relations with our buyers, we however innovate our solution lists all of the time to satisfy the brand new demands and adhere to the most up-to-date development of the market in Malta. We have been ready to face the worries and make the improve to understand all the possibilities in international trade.
By Edith from Cyprus - 2018.09.29 13:24
Although we are a small company, we are also respected. Reliable quality, sincere service and good credit, we are honored to be able to work with you!
By Albert from Paris - 2017.11.01 17:04