China High Quality 3-Amino-5-Mercapto-1 2 4-Triazole Solubility - 3-Amino-5-mercapto-1, 2, 4-triazole – Hailun New Material factory and suppliers

High Quality 3-Amino-5-Mercapto-1 2 4-Triazole Solubility - 3-Amino-5-mercapto-1, 2, 4-triazole – Hailun New Material

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High Quality 3-Amino-5-Mercapto-1 2 4-Triazole Solubility - 3-Amino-5-mercapto-1, 2, 4-triazole – Hailun New Material Detail:

Product Name: 3-Amino-5-mercapto-1,2,4-triazole
3-Amino-1,2,4-triazole-5-thiol; 5-amino-4h-1,2,4-triazole-3-thiol; ATSA
CAS: 16691-43-3
Molecular Formula:C2H4N4S
Molecular Weight: 116.14
Appearance and properties: gray white powder
Density: 2.09 g / cm3
Melting point: > 300 ° C (lit.)
Flash point: 75.5 ° C
Rate: 1.996
Steam pressure: 0.312mmhg at 25 ° C
Structural Formula:

Use: As pharmaceutical and pesticide intermediate,It can be used as additive of ballpoint

pen ink, lubricant and antioxidant

Index name	Index Value
Appearance	white or grey powder
Assay	≥ 98 %
M.P.	300 ℃
Drying loss	≤ 1 %

If 3-amino-5-mercapto-1,2 is inhaled, 4-triazole, please move the patient to fresh air; in case of skin contact, take off the contaminated clothes and wash the skin thoroughly with soapy water and water. If you feel uncomfortable, seek medical advice; if you have eye clear contact, separate the eyelids, rinse with flowing water or normal saline, and seek medical advice immediately; if ingested, gargle immediately, do not induce vomiting, and seek medical advice immediately.

It is used to prepare a photoresist cleaning solution

In the common LED and semiconductor manufacturing process, the mask of photoresist is formed on the surface of some materials, and the pattern is transferred after exposure. After obtaining the required pattern, the residual photoresist needs to be stripped before the next process. In this process, it is required to completely remove the unnecessary photoresist without corroding any substrate. At present, photoresist cleaning solution is mainly composed of polar organic solvent, strong alkali and / or water, etc. the photoresist on the semiconductor wafer can be removed by immersing the semiconductor chip into the cleaning liquid or washing the semiconductor chip with the cleaning liquid.

A new type of photoresist cleaning solution has been developed, which is a non-aqueous low etching detergent. It contains: alcohol amine, 3-amino-5-mercapto-1,2,4-triazole and cosolvent. This kind of photoresist cleaning solution can be used to remove photoresist in LED and semiconductor. At the same time, it has no attack on the substrate, such as metal aluminum. What’s more, the system has strong water resistance and widens its operation window. It has a good application prospect in the fields of LED and semiconductor chip cleaning.

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Just about every member from our large efficiency income crew values customers' wants and enterprise communication for High Quality 3-Amino-5-Mercapto-1 2 4-Triazole Solubility - 3-Amino-5-mercapto-1, 2, 4-triazole – Hailun New Material , The product will supply to all over the world, such as: Angola, United Arab Emirates, UAE, In the increasingly competitive market, With sincere service high quality products and well-deserved reputation, we always offer customers support on products and techniques to achieve long-term cooperation. Living by quality, development by credit is our eternal pursuit, We firmly believe that after your visit we will become long-term partners.

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The sales manager is very patient, we communicated about three days before we decided to cooperate, finally, we are very satisfied with this cooperation!